| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition method capable of easily performing mask film deposition such as a high-precisoon vapor deposition by preventing or suppressing occurrence of deflection in a mask. SOLUTION: In the film deposition method, a film pattern is formed in a substrate 4 for film deposition via a mask 1. The mask 1, the substrate 4 for film deposition, and a first member 5 having a flat surface in contact with the substrate 4 for film deposition are successively arranged from a feed source 12 side of a film deposition material, then the mask film deposition is performed while magnetically attracting the mask 1 and the first member 4. COPYRIGHT: (C)2006,JPO&NCIPI
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