摘要 |
The griping mechanism of the present invention comprises a thin flat body having two linearly moveable side fingers and a pair of rotating and linearly moveable distal fingers. In contrast to gripper of conventional design, the gripping mechanism of the invention is positioned over the object. In spite of an overhead position, the gripper is contamination-free since it has a completely closed design. In the vicinity of the gripping fingers, the mechanism is provided with soft edge-supporting pads having tapered surfaces for self-alignment and centering of the circular objects. The pads also eliminate surface contact between the wafer and the surface of the gripper body. The overhead position of the gripper makes it possible to simplify the construction of a wafer-holding chuck, e.g., on wafer processing stations. The gripper has auxiliary object-uplifting means in the form of vacuum suction ports or blowing nozzles that generate a vortex effect for uplifting the objects to the level required for edge gripping.
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