Device for plasma-chemical gas phase deposition on substrate in vacuum has HF-electrode installed outside reaction chamber, and complete reaction chamber and/or parts of it are temporarily removable and/or exchangeable

摘要

The device is for the plasma-chemical gas phase deposition on a substrate in the vacuum, whereby installed inside a vacuum chamber are a HF-electrode (2) connected to the AC voltage source and a substrate electrode (3) lying opposite the HF-electrode. A reaction chamber with at least one process gas feed and inlet and outlet openings for substrates is formed around a plasma formation area (1). The HF-electrode is installed outside the reaction chamber, and the complete reaction chamber and/or parts (4.1,4.2) of it are temporarily removable and/or exchangeable.