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发明名称
Verfahren zum Herstellen eines Sputtertargets aus einer Si-Basislegierung
摘要
申请公布号
DE50303674(D1)
申请公布日期
2006.07.20
申请号
DE20035003674
申请日期
2003.11.04
申请人
W.C. HERAEUS GMBH
发明人
HEINDEL, JOSEF;WEIGERT, MARTIN, DR.;KONIETZKA, UWE
分类号
B22D18/04;C23C14/34;B22D15/02;B22D23/06;B22D27/15;C22C28/00;H01J37/34
主分类号
B22D18/04
代理机构
代理人
主权项
地址
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