| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a device and a method for treating a substrate capable of sufficiently preventing the contamination of the rear of the substrate. <P>SOLUTION: When the substrates W are carried to an exposure device 14, a hand H5 is used on the upper side of a carrying mechanism IFR for an interface. When the substrates are carried out from the exposure device 14, the hand H6 on the lower side of the carrying mechanism IFR for the interface is used. When the substrates W after an exposure treatment by the exposure device 14 are carried to a drying treating section 95, the hand CRH10 is used on the lower side of a fifth center robot CR5. When the substrates W are carried after a drying treatment carried out from the drying treating section 95, the hand CRH9 is used on the upper side of the fifth center robot CR5. That is, the hands H5 and CRH9 are employed for carrying the substrates W on which a liquid does not adhere, and the hands H6 and CRH10 are employed for carrying the substrates W on which the liquid adheres. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
