| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate polishing device of a compact constitution occupying a reduced area and capable of being stably operated with suppressing vibration of a drive shaft. <P>SOLUTION: The substrate polishing device is equipped with a polishing table 48 having a polishing plate 50 and the drive shaft 68 connected eccentrically with the polishing table 48 and causing the polishing table 48 to make translational and circular motion integrally with the polishing plate 50. The size of the polishing table 48 is designed to be almost equal to the substrate to be polished, and a plurality of polishing liquid jetting holes 50a communicating with a space 78 formed between the polishing plate 50 and the polishing table 48 are formed inside the polishing plate 50. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
