发明名称 FORMING METHOD OF SHADOW MASK PATTERN
摘要 <P>PROBLEM TO BE SOLVED: To provide a forming method of a shadow mask pattern capable of preventing bending and distortion of the pattern by having tension impressed in formation of the pattern on the mask used acting uniformly on the pattern formation part of the mask, when an organic substance layer is vapor-deposited to manufacture the organic electroluminescent element of an organic luminescent display device. <P>SOLUTION: This is a method of forming a pattern on a mask sheet which consists of a fixing part to fix in a state that a tensile force is impressed on a mask frame and a pattern formation part on which the pattern is formed. The method consists of a step in which an auxiliary sheet having a relatively thick thickness is positioned at the lower part of the mask sheet, a step in which a tension to correspond to the tensile force is impressed on the mask sheet and the auxiliary sheet, and the mask sheet and the auxiliary sheet are fixed together, and a step in which a pattern is formed on the pattern formation part of the mask sheet fixed. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006190655(A) 申请公布日期 2006.07.20
申请号 JP20050347030 申请日期 2005.11.30
申请人 SAMSUNG SDI CO LTD 发明人 KIM JIN-KYOO;KAN SHOSHIN;KANG HEE CHEOL;KANG EU GENE;KIM TAE HYUNG
分类号 H05B33/10;C23C14/04;H01L51/50 主分类号 H05B33/10
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