| 摘要 |
PROBLEM TO BE SOLVED: To shorten an film forming time and enable the efficient utilization of a material gas by solving the insufficient supply of the material gas to the center of a substrate. SOLUTION: A first material gas A and a second material gas B are alternately supplied to a processing chamber housing a substrate without allowing the mixture of the gases A and B, thereby forming a desired thin film on the substrate. In supplying one of the first and second material gases to the processing chamber, the gas is supplied while making pressure in the processing chamber vertically fluctuate. COPYRIGHT: (C)2006,JPO&NCIPI
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