| 摘要 |
Disclosed is method of fabricating semiconductor heater film which is formed on a substrate with excellent heat resistant and electrical insulation property by depositing atomized particles of coating material essentially formed of powdered metallic (Sn,V) chlorides and silicide mixed with one of Fe, Sb or In compound and solvent such as water, methyl and ethyle alcohols, hydrochloric acid, sulfuric acid, also small amount of non-organic acid is added to intensify the chemical affinity of the coating material.
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