| 摘要 |
PROBLEM TO BE SOLVED: To provide a technique for improving the planarity of a member surface embedded in a plurality of recessed part, without increasing a manufacturing process time. SOLUTION: By arranging a first dummy pattern DP<SB>1</SB>having a relatively large area and a second dummy pattern DP<SB>2</SB>having a relatively small area in a dummy region FA, a dummy pattern can be arranged close to a boundary BL, between an element forming region DA and the dummy region FA. Accordingly, the planarity of the surface of a silicon oxide film embedded in an isolation groove is improved in the whole region of the dummy region FA. Further, by occupying a relatively large region out of the dummy region FA with the first dummy pattern DP<SB>1</SB>, an increase in the amount of data of a mask is suppressed. COPYRIGHT: (C)2006,JPO&NCIPI
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