| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for evaluating silicon wafer crystal defects with a specific resistance value of 0.01Ωcm or less wafer that have been evaluated so far by a physical method because no wet etching method can be used. SOLUTION: This method prepares a corrosion liquid for silicon wafer crystal defect evaluation by mixing the potassium permanganate KMnO<SB>4</SB>and the hydrogen fluoride HF with a volume ratio of 0.5-1:1-3 and employs a wet chemical method to evaluate silicon wafer crystal defects whose specific resistance value is 0.01Ωcm or less. This method can simply and quickly evaluate silicon wafer crystals from the patterns corroded using this liquid without chrome. COPYRIGHT: (C)2006,JPO&NCIPI
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