发明名称 |
Exposure apparatus and device manufacturing method |
摘要 |
An exposure apparatus which forms a pattern on an object includes an exposure head structure in which a plurality of elemental exposure units each including at least one light source and an optical element which forms an image of the light source on the object are arrayed, a sensor which detects the surface position of the object, and a controller which controls exposure by the exposure head structure based on the detection result by the sensor. The controller forms a pattern on the object while selectively operating one of the plurality of elemental exposure units, which satisfies a predetermined condition.
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申请公布号 |
US2006158504(A1) |
申请公布日期 |
2006.07.20 |
申请号 |
US20060336754 |
申请日期 |
2006.01.19 |
申请人 |
SUGITA MITSURO;OHMI KAZUAKI;YONEHARA TAKAO;TSUJI TOSHIHIKO;TERASHI TAKAAKI;KOHDA TOHRU;TSUTSUI SHINJI |
发明人 |
SUGITA MITSURO;OHMI KAZUAKI;YONEHARA TAKAO;TSUJI TOSHIHIKO;TERASHI TAKAAKI;KOHDA TOHRU;TSUTSUI SHINJI |
分类号 |
B41J2/385 |
主分类号 |
B41J2/385 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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