发明名称 |
Optical mask and manufacturing method of thin film transistor array panel using the optical mask |
摘要 |
A photo mask is provided. The mask includes: a transmitting area and a translucent area, wherein the translucent area includes a plurality of light blocking portions blocking light, and wherein the light blocking portions have a plurality of areas blocking different amounts of light. By using this type of photo mask, a substantially flat layer of photoresist film can be deposited even on top of an uneven surface. The flat photorseist film reduces processing cost and enhances the reliability of the panel manufacturing process. |
申请公布号 |
US2006160279(A1) |
申请公布日期 |
2006.07.20 |
申请号 |
US20050313150 |
申请日期 |
2005.12.19 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
PARK JEONG-MIN;LEE HI-KUK;JEON WOO-SEOK;KIM JOO-HAN;JUNG DOO-HEE |
分类号 |
H01L21/84;G03F1/54;G09F9/30;H01L21/336;H01L27/148;H01L29/786 |
主分类号 |
H01L21/84 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|