| 发明名称 |
Siloxanhaltige Harze und isolierender Film daraus für Halbleiter-Zwischenschicht |
| 摘要 |
<p>A siloxane-based resin having a novel structure and a semiconductor interlayer insulating film using the same. The siloxane-based resins have a low dielectric constant in addition to excellent mechanical properties and are useful materials in an insulating film between interconnect layers of a semiconductor device.</p> |
| 申请公布号 |
DE602004001097(D1) |
申请公布日期 |
2006.07.20 |
| 申请号 |
DE20046001097T |
申请日期 |
2004.06.23 |
| 申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LYU, YI YEOL;RYU, JOON SUNG;SONG, KI YONG;SEON, JONG BAEK |
| 分类号 |
C08G77/50;B32B17/02;B32B25/20;C08G77/04;C09D183/04;C09D183/14;H01B3/46;H01L21/00;H01L21/31;H01L21/312;H01L21/469;H01L21/768;H01L23/522 |
主分类号 |
C08G77/50 |
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