发明名称 LITHOGRAPHIC DEVICE, RADIATION SYSTEM AND FILTER DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a lithographic device, an illumination system and a filter device. <P>SOLUTION: The filter device includes at least first and second heat sinks. the individual foil of a first set is thermally connected to the first heat sink and the individual foil of a second set is thermally connected to the second heat sink, whereby, while in use, heat is guided to conduct substantially to the first heat sink through the individual foil of the first set while heat is guided to conduct substantially to the second heat sink through the individual foils of the second set. The foil of the first set extends substantially within a first section of a determined cross-section and the foil of the second set extends substantially within a second section of a determined cross-section. The first section and the second section are not superimposed on each other actually. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006191061(A) 申请公布日期 2006.07.20
申请号 JP20050374906 申请日期 2005.12.27
申请人 ASML NETHERLANDS BV 发明人 WASSINK ARNOUD CORNELIS
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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