| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide lithographic equipment equipped with a filter system whose performance is still allowable at a light transmission point thereof even if the filter system is heated, and a lighting system equipped with the filter system, or the filter system itself. <P>SOLUTION: The lithographic equipment includes the lighting system configured so as to adjust a radiation beam, and the filter system for filtering fine dust particles from the radiation beam. The filter system includes multiple foils for collecting the fine dust particles. At least one foil of the multiple foils contains at least two portions which are provided with mutually distinct inclinations and are mutually linked along substantially linear coupling lines. Each of these two portions substantially coincides with a virtual flat surface penetrating a predetermined position which is intended to substantially coincide with a radiation source generating a radiation in the case of using. The substantially linear coupling line coincides with a virtual straight line similarly penetrating this predetermined position. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
