| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a uniformity correction system for improving uniformity of irradiation light in lithography apparatus. <P>SOLUTION: A device of controlling an illumination level is disposed between an illumination optical system and a contrast device, the device being configured such that it has a plurality of correction elements each of which includes a compensation portion and a normal attenuation portion, wherein the compensation portion has a first attenuation, and the normal attenuation portion has a second attenuation. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
