发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A liquid confinement structure configured to contain a liquid in a space between a projection system and a substrate has a recess in its lower surface which is open to both a relatively low pressure source and a relatively high pressure source and through which liquid and/or gas from between the liquid confinement structure and the substrate is extracted.
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申请公布号 |
US2006158627(A1) |
申请公布日期 |
2006.07.20 |
申请号 |
US20060330394 |
申请日期 |
2006.01.12 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
KEMPER NICOLAAS R.;DONDERS SJOERD NICOLAAS L.;HOOGENDAM CHRISTIAAN A.;KATE NICOLAAS T.;MEULEN FRITS V.D. |
分类号 |
G03B27/42 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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