| 发明名称 |
AMINE COMPOUNDS, RESIST COMPOSITIONS AND PATTERNING PROCESS |
| 摘要 |
<p>Novel amine compounds having a nitrogen-containing cyclic structure and a hydrating group such as a hydroxy, ether, ester, carbonyl, carbonate group or lactone ring are useful for use in resist compositions for preventing a resist film from thinning and also for enhancing the resolution and focus margin of resist.</p> |
| 申请公布号 |
KR20060083401(A) |
申请公布日期 |
2006.07.20 |
| 申请号 |
KR20060057811 |
申请日期 |
2006.06.27 |
| 申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
HATAKEYAMA JUN;KOBAYASHI TOMOHIRO;WATANABE TAKERU;NAGATA TAKESHI |
| 分类号 |
C07D295/08;C07D295/14;G03F7/004;G03F7/038;G03F7/039 |
主分类号 |
C07D295/08 |
| 代理机构 |
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