| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a device, a top coat material, and a substrate with top coat. <P>SOLUTION: In immersion lithography, thicknesses d<SB>l</SB>, d<SB>tc</SB>and d<SB>r</SB>and refractive indexes n<SB>l</SB>, n<SB>tc</SB>and nr of an immersion fluid, top coat and resist are let to meet conditions: n<SB>l</SB>≤n<SB>tc</SB>≤n<SB>r</SB>, d<SB>l</SB>>about 5.λ and d<SB>tc</SB>≤about 5.λ to prevent internal reflection from occurring in a final element, the immersion fluid and the top coat of a projection system. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
