| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus provided with an improved motion control system for controlling the movement of a movable target object, where at least one of a patterning device and a supporting part of a substrate can be moved for instance. <P>SOLUTION: The motion control system comprises a control device having a transfer function. The control device controls the position of a movable target object along a plurality of continuous positions. The transfer function is constituted of a sum of a plurality of position transfer functions each of which is determined in each of these positions, and each position transfer function is multiplied by a weighting function. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
