| 发明名称 |
METHOD AND SYSTEM FOR FORMING LITHOGRAPHIC BEAM |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an improved system and a method for lithographic illumination that provides a projection beam with a desired output. <P>SOLUTION: The device and the method for the lithographic illumination include steps of: receiving radiation beams of a plurality of radiation sources from a plurality of corresponding radiation sources; deflecting the radiation beams of the plurality of radiation sources along a common beam path; thereby generating a projection beam of radiation; providing the projection beam of radiation with a cross-section pattern; and projecting the patterned projection beam of radiation to a target portion of a substrate. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
| 申请公布号 |
JP2006191063(A) |
申请公布日期 |
2006.07.20 |
| 申请号 |
JP20050375393 |
申请日期 |
2005.12.27 |
| 申请人 |
ASML NETHERLANDS BV |
发明人 |
DE JAGER PIETER WILLEM HERMAN;BASELMANS JOHANNES JACOBUS MATHEUS;BRUINSMA ANASTASIUS JACOBUS ANICETUS;MUNNIG SCHMIDT ROBERT-HAN;VINK HENRI JOHANNES PETRUS |
| 分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
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