| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for forming a microstructure for easily forming a three-dimensional microstructure without requiring relative movement of a mask and a substrate. <P>SOLUTION: Since an exposure mask 300 having a first exposure light transmitting region r1 which transmits exposure light R from a light source and a second exposure light transmitting region r2 where the transmittance for the exposure light is lower than that of the first exposure transmitting region r1 is used, the distribution of exposure light quantity (light energy) can be controlled to continuously change without relatively moving a substrate 1 having a resist film 2 formed thereon and the exposure mask 300, and exposure with a depth corresponding to the distribution of the exposure light quantity (light energy) can be carried out between an exposure region d1 and an exposure region d2 of the resist layer 2. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
