ORGANIC POLYMER FOR FORMING ORGANIC ANTIREFLECTION FILM

摘要

PROBLEM TO BE SOLVED: To provide an organic polymer for an organic antireflection film for forming the organic antireflection film positioned between an etched layer and a photoresist film for absorbing an exposure source in a photolithography process and to provide an organic composition containing the above polymer.

SOLUTION: The organic polymer for forming the organic antireflection film comprises repeating units represented by the formula (1) and the formula (2) [in the formula, R1is hydrogen or a methyl group and R2is 1-5C alkyl group].

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