| 摘要 |
PROBLEM TO BE SOLVED: To provide an imprint lithography method in which resolution and superposition accuracy are improved. SOLUTION: The imprint lithography method comprises: a step for subjecting an imprintable medium on a substrate to a condition that the medium is at a first temperature which may subject the medium to a flowable state, where the imprintable medium comprises an imprint material selected from a group consisting of a crystalline material and a polycrystalline material; a step for pressing a template into the medium to form an imprint in the medium; a step for cooling the medium to a second temperature which may subject the medium to a substantially non-flowable state while the medium is brought into contact with the template 46; and a step for separating the medium from the template 46 in the substantially non-flowable state. COPYRIGHT: (C)2006,JPO&NCIPI
|
