CMOS IMAGE SENSOR AND METHOD FOR FABRICATING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a CMOS image sensor in which a light shielding film is formed so as to improve light reflection characteristics and so as to protect the microlenses during packaging, and to provide a method of fabricating the same. SOLUTION: The CMOS image sensor includes a semiconductor substrate; a plurality of photo sensing elements on the semiconductor substrate; a first insulating film on the substrate including the photo sensing elements; a plurality of metal wirings formed on the first insulating film; a second insulating film formed on the first insulating film including the metal wirings; the light shielding film formed on the second insulating film; and the microlenses on the second insulating film in the gaps of the patterned light shielding film. COPYRIGHT: (C)2006,JPO&NCIPI