发明名称 |
Systems and methods for determining width/space limits for mask layout |
摘要 |
Systems for determining width/space limits for product mask layouts. A mask writer generates a first pattern on a test mask corresponding to a test mask layout. A lithography tool generates a second pattern on a wafer corresponding to a first pattern on a test mask by a lithography process using a preset exposure dose. A metrology tool measures widths of the first and second pattern. A controller determines a width/space limit for the product mask layout according to the width difference between the first and second pattern.
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申请公布号 |
US2006160001(A1) |
申请公布日期 |
2006.07.20 |
申请号 |
US20050037005 |
申请日期 |
2005.01.19 |
申请人 |
WINBOND ELECTRONICS CORP. |
发明人 |
WANG LI-MING |
分类号 |
G03F1/00;G03B27/00;G03C5/00;G06F17/50 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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