| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate on which single crystal silicon layers are locally integrated, and its manufacturing method. SOLUTION: The substrate that is provided on a supporting plate 10, a buffer layer 11 formed on the supporting plate 10, and a primary region 30 defined in a partial region of the supporting plate 10, which is, after being fabricated separately, is provided on a single crystal silicon layer 40 fixed through bonding to the buffer layer 11 and locally integrated, and a secondary region 20 of the supporting plate 10 excluding the primary region 30, has a non-single crystal silicon layer 13 obtained through vapor deposition for the buffer layer 11. This enables a large-sized display panel and the like to be manufactured regardless of the size of a manufacturable single crystal silicon layer. COPYRIGHT: (C)2006,JPO&NCIPI |
