发明名称 SUBSTRATE COATED WITH AMORPHOUS CARBON FILM AND METHOD FOR FORMING AMORPHOUS CARBON FILM
摘要 PROBLEM TO BE SOLVED: To provide a substrate coated with an amorphous carbon film which has improved adhesion to the substrate and imparts gas barrier properties to the substrate, and to provide a method for forming the amorphous carbon film. SOLUTION: The substrate 20 coated with the amorphous carbon film is produced by forming the amorphous carbon film 22 on the surface of the substrate 21 under a reduced pressure through a discharge plasma process, wherein an active layer 23 containing either or both of oxygen and nitrogen is formed in an interface between the substrate 21 and the amorphous carbon film 22. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006188734(A) 申请公布日期 2006.07.20
申请号 JP20050001813 申请日期 2005.01.06
申请人 MITSUBISHI HEAVY IND LTD 发明人 SAKAI TOMOTSUGU;YAMAZAKI NORIKO;DANNO MINORU;WATANABE TOSHIYA
分类号 C23C16/27;B65D25/14 主分类号 C23C16/27
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