发明名称 Method of inspecting substrate processing apparatus, and storage medium storing inspection program for executing the method
摘要 A method of inspecting a substrate processing apparatus that enables a reduction in operator labor time to be achieved. A host computer instructs a substrate processing apparatus to prohibit transfer of a product wafer into the substrate processing apparatus during a period of cleaning the substrate processing apparatus. The substrate processing apparatus notifies the host computer of a number and types of inspection wafers to be used in inspections for predetermined inspection items. The host computer notifies the substrate processing apparatus that preparation of the inspection wafers has been completed.
申请公布号 US2006160256(A1) 申请公布日期 2006.07.20
申请号 US20060329078 申请日期 2006.01.11
申请人 TOKYO ELECTRON LIMITED 发明人 OBI AKIRA;NAKAMURA HIROSHI
分类号 H01L21/66 主分类号 H01L21/66
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