The invention relates to a device for adjusting the temperature of elements, especially adjusting the temperature of a projection lens (1) or of parts of a projection lens (1) for use in semiconductor lithography. Said device comprises a temperature-adjusting jacket (18) which is provided with at least one temperature-adjusting line (19). Said at least one temperature-adjusting line (19) is formed into the temperature-adjusting jacket (18).
申请公布号
WO2006037494(A3)
申请公布日期
2006.07.20
申请号
WO2005EP10351
申请日期
2005.09.24
申请人
CARL ZEISS SMT AG;SCHWERTNER, TILMAN;BINGEL, ULRICH;ZIMMER, KLAUS