发明名称 METHOD AND APPARATUS FOR PROVIDING STRUCTURAL SUPPORT FOR INTERCONNECT PAD WHILE ALLOWING SIGNAL CONDUCTANCE
摘要 <p>A method (10) provides an interconnect (60, 160, 260) structure having enhanced structural support when underlying functional metal layers are insulated with a low modulus dielectric. A first metal layer (80) having a plurality of openings overlies the substrate. A first electrically insulating layer (82) overlies the first metal layer. A second metal layer (84) overlies the first electrically insulating layer, the second metal layer having a plurality of openings. An interconnect pad (61, 140) that defines an interconnect pad area overlies the second metal layer. At least a certain amount of the openings (98, 99) in the two metal layers are aligned to improve structural strength of the interconnect structure. The amount of alignment may differ depending upon the application and materials used. A bond wire connection or conductive bump may be used with the interconnect structure.</p>
申请公布号 WO2006076082(A2) 申请公布日期 2006.07.20
申请号 WO2005US43207 申请日期 2005.11.30
申请人 FREESCALE SEMICONDUCTOR, INC.;HESS, KEVIN J.;DOWNEY, SUSAN H.;MILLER, JAMES W.;YONG, CHENG CHOI 发明人 HESS, KEVIN J.;DOWNEY, SUSAN H.;MILLER, JAMES W.;YONG, CHENG CHOI
分类号 H01L21/4763 主分类号 H01L21/4763
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