| 摘要 |
<p>[PROBLEMS] To provide an actinic-energy-ray-curable composition which, when used as a composition for pattern formation, has high sensitivity to exposure light and satisfactory developability and can form a fine precise pattern and which after curing is excellent in various properties including film strength, heat resistance, and chemical resistance; a composition for pattern formation which, when used in color filter formation in liquid-crystal panel production, not only has those performances but, after curing, has high elasticity and an elastic behavior which makes the cured composition suitable for use as columnar spacers and a protective film; and a coloring composition which, when used, e.g., for forming pixels of a color filter, gives a colored layer reduced in color unevenness and contrast unevenness. [MEANS FOR SOLVING PROBLEMS] The actinic-energy-ray-curable compositions contain as an essential ingredient a compound (a) having two or more ethylenically unsaturated groups, a tertiary amine group, and an acid group.</p> |
