发明名称 SEMICONDUCTOR DEVICE AND ITS FABRICATION PROCESS
摘要 <P>PROBLEM TO BE SOLVED: To uniformize a pattern matching precision in the same shot region. <P>SOLUTION: BOX marks BX1 and BX2 are arranged at a plurality of positions on a scribe line SC in the same shot region SH, matching position of the BOX marks BX1 and BX2 arranged at a plurality of positions is measured, an amount of offset of a stepper at the time of exposing the shot region SH is set according to the measurements, and stepper positioning control is made at the time of exposing the shot region SH according to the amount of offset thus set. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006190742(A) 申请公布日期 2006.07.20
申请号 JP20050000440 申请日期 2005.01.05
申请人 SEIKO EPSON CORP 发明人 SASE YASUKI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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