SUBSTRATE HEATING DEVICE, VACUUM DEVICE AND SUBSTRATE HEATING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a substrate heating device where the temperature of a substrate is raised at high speed while suppressing substrate deformation to be small and making uniform the temperature of a whole face of the substrate in a short time even in the large substrate.

SOLUTION: The substrate heating device has soaking plates 5 and first heaters 1. The soaking plates 5 are arranged in a cabinet 10, and have first faces 9. The substrate 4 is made close to the first faces 9 and can be held. The first heaters 1 are disposed in the cabinet 10 and face the first faces 9. When the substrates 4 are held in the first faces 9, the substrates 4 can be heated. The soaking plates 5 are formed of materials having thermal conductivity higher than those of the substrates 4. The soaking plates 5 may have second heaters 20 heating the soaking plates 5.

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