发明名称 Method of manufacturing semiconductor device
摘要 A semiconductor device has a two-dimensional slab photonic crystal structure in which a substrate supports a sheet-like slab layer including, sequentially stacked, a lower cladding layer, an active layer, and an upper cladding layer. A periodic refractive index profile structure, in surfaces of the stacked layers, introduces a linear defect region that serves as a waveguide. A p-type region and an n-type region in the slab layer define a pn junction surface at a predetermined angle with respect to the surfaces of the stacked layers in the slab layer.
申请公布号 US2006157716(A1) 申请公布日期 2006.07.20
申请号 US20060375016 申请日期 2006.03.15
申请人 KYOTO UNIVERSITY 发明人 SUGITATSU ATSUSHI;TADA HITOSHI;NODA SUSUMU
分类号 H01S5/20;G02B6/122;H01S5/042 主分类号 H01S5/20
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