| 摘要 |
<p>A negative resist composition which can give a resist pattern inhibited from swelling. The negative resist composition comprises (A) an alkali-soluble resin ingredient, (B) an acid generator ingredient which generates an acid upon exposure to light, and (C) a crosslinking agent ingredient, wherein the alkali-soluble resin ingredient (A) is a copolymer (A1) comprising a structural unit (a1) having in the backbone an alicyclic group having a fluorinated hydroxyalkyl group, a structural unit (a2) derived from an acrylic ester having a hydroxylated, chain or cyclic alkyl group and having a fluoroalkyl group or fluorine atom bonded in the a-position, and a structural unit (a3) derived from an acrylic ester which has an alicyclic group having a fluorinated hydroxyalkyl group and has a fluoroalkyl group or fluorine atom bonded in the a-position.</p> |
