Plasma Processing Method, Plasma Etching Method and Solid-State Imaging Element Producing Method,申请号KR20040066624-传众专利搜索

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发明名称	Plasma Processing Method, Plasma Etching Method and Solid-State Imaging Element Producing Method
摘要
申请公布号	KR100602960(B1)	申请公布日期	2006.07.20
申请号	KR20040066624	申请日期	2004.08.24
申请人		发明人
分类号	H01L27/14;H01L21/00;H01L21/302;H01L21/3065;H01L21/311;H01L21/461;H01L21/84;H01L27/148;H05H1/00	主分类号	H01L27/14
代理机构		代理人
主权项
地址

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