| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a device for a neutral particle ray beam in which, although neutralization of particle beam is necessary for adjusting processing shapes precisely, this neutralization can be controlled independently from forming conditions and processing conditions of the ion beams, and a high quality neutral particle beam can be obtained. <P>SOLUTION: This is a device for a neutral particle ray beam having a plasma chamber 1 for forming plasma and emitting ion beams, a capillary part 2 for neutralizing ion beams, and a processing chamber 3 for irradiating the beams passing the capillary part on the processed object. The capillary part has a means which supplies and exhausts neutral gas into and from the capillary and a control means which controls these and establishes the neutral gas pressure to a prescribed value. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
