发明名称 METHOD AND EXPOSURE EQUIPMENT FOR PERFORMING INCLINED FOCUSING, AND DEVICE MANUFACTURED ACCORDING TO THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus which can be used by combining with (E)UV radiation. <P>SOLUTION: A method of performing an inclined focal test including each step of generating a target object, a projection beam for irradiation, at least one reflective device, and a projection beam for first projected irradiation on the target object by using at least one reflective device in a first direction, comprises steps of: providing a second projection beam with an inclination against the first projection beam by using an inclination device for inclining at least one reflective device in a second direction; generating a projection beam of a second projected irradiation on the target object; determining the lateral movement of the first and second projected projection beams on the target object; and determining the focal deviation of the target object against the projected projection beams from the lateral movement. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006191046(A) 申请公布日期 2006.07.20
申请号 JP20050372933 申请日期 2005.12.26
申请人 ASML NETHERLANDS BV 发明人 HAUSCHILD JAN
分类号 H01L21/027 主分类号 H01L21/027
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