发明名称 Lithographic projection apparatus and device manufacturing method
摘要 <p>A immersion lithographic apparatus is disclosed in which one or more liquid diverters (50;60,62,64,66,68,70) are positioned in a space (11) surrounded by a liquid confinement structure (12). The function of the liquid diverter(s) is to hinder the formation of one or more recirculation zones of immersion liquid which may lead to variations in refractive index of the immersion liquid in the space and thereby imaging errors.</p>
申请公布号 EP1681596(A1) 申请公布日期 2006.07.19
申请号 EP20060250136 申请日期 2006.01.11
申请人 ASML NETHERLANDS BV 发明人 LIEBREGTS, PAULUS MARTINUS MARIA;JACOBS, JOHANNES HENRICUS WILHELMUS;UITTERDIJK, TAMMO
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
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