| 摘要 |
<p>Apparatus for contacting an array substrate (126) with a fluid and novel methods for washing an array substrate (126) are disclosed. In an embodiment, the apparatus includes a housing defining a wash chamber (120), a fluid inlet (136) in fluid communication with the wash chamber (120), a drain (130) in fluid communication with the wash chamber (120), a gas inlet (148) adapted to direct a stream of gas over a surface of the array substrate (126), and a program controller (142) in operable relation to the wash chamber (120), the program controller (142) operable to perform a washing protocol which includes automatically filling the wash chamber (120) with said fluid. A method as described includes placing the array substrate (126) in a wash chamber (120), triggering a first drain and fill step, automatically performing a second drain and fill step, and automatically performing a slow drain step.</p> |
