| 发明名称 |
Exposure head, exposure apparatus, and application thereof |
| 摘要 |
A method of creating a micro-channel in a substrate surface by exposing a resist film with a laser beam, removing the exposed resist film per the predetermined pattern, and etching the substrate using the predetermined pattern to form the micro-channel.
|
| 申请公布号 |
US7077972(B2) |
申请公布日期 |
2006.07.18 |
| 申请号 |
US20050104598 |
申请日期 |
2005.04.13 |
| 申请人 |
FUJINON CORPORATION |
发明人 |
ISHIKAWA HIROMI;NAGANO KAZUHIKO;OKAZAKI YOJI;FUJII TAKESHI;YAMAKAWA HIROMITSU |
| 分类号 |
B23K26/00;B23K26/06;B29C67/00;B41J2/16;B41J2/447;B41J2/465;B41J2/47;D06L3/04;D06M10/00;G02B26/08;G03F7/20;H04N1/12;H04N1/191 |
主分类号 |
B23K26/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
