发明名称 Nitride semiconductor LED improved in lighting efficiency and fabrication method thereof
摘要 A nitride semiconductor LED improved in lighting efficiency and a fabrication method thereof, in which an n-doped semiconductor layer is formed on a substrate. An active layer is formed on the n-doped semiconductor layer to expose at least a partial area of the n-doped semiconductor layer. A p-doped semiconductor layer is formed on the active layer. A p+-doped semiconductor layer is formed on the p-doped semiconductor layer. An n+-doped semiconductor layer is formed in at least a partial upper region of the p+-doped semiconductor layer via n-dopant ion implantation. The n+-doped semiconductor layer cooperates with an underlying partial region of the p+-doped semiconductor layer to realize a reverse bias tunneling junction. Also, an upper n-doped semiconductor layer is formed on the n+-doped semiconductor layer to realize lateral current spreading. The invention can improve lighting efficiency by using the reverse bias tunneling junction and/or the lateral current spreading.
申请公布号 US7078256(B2) 申请公布日期 2006.07.18
申请号 US20040875321 申请日期 2004.06.25
申请人 SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 RYU YUNG HO;YANG KEE JEONG;OH BANG WON;PARK JIN SUB;KIM YOUNG HOON
分类号 H01L21/00;H01L29/76;H01L29/94;H01L31/062;H01L31/113;H01L31/119;H01L33/06;H01L33/12;H01L33/32;H01L33/42 主分类号 H01L21/00
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