发明名称 Thermally-generated mask pattern
摘要 A mask having a first region and a second region; the first region having a multilayer mirror over a substrate, the multilayer mirror having alternating layers of a first material and a second material, the first material having a high index of refraction, the second material having a low index of refraction; and the second region having a compound of the first material and the second material over the substrate.
申请公布号 US7078136(B2) 申请公布日期 2006.07.18
申请号 US20030737551 申请日期 2003.12.15
申请人 INTEL CORPORATION 发明人 YAN PEI-YANG
分类号 G03F9/00;G03F1/00;G03F1/14 主分类号 G03F9/00
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