发明名称 Inspection method, inspection apparatus, and facility diagnosis unit
摘要 To inspect a status of an inspection object by using an inspection apparatus for extracting amount of characteristic to an inputted waveform signal and determining a status on the basis of the extracted amount of characteristic. Specifically, the inspection apparatus uses a normal knowledge that is generated on the basis of only the data of a normal status at an initial stage to determine whether or not the status of the inspection object complies with the normal status. The inspection apparatus generates an abnormal kind knowledge by abnormal kind on the basis of the data of an abnormal status that are collected in accordance with repeat of the determination, and then, determines the status by using the normal knowledge and the abnormal kind knowledge.
申请公布号 US7079979(B2) 申请公布日期 2006.07.18
申请号 US20040944414 申请日期 2004.09.20
申请人 OMRON CORPORATION 发明人 FUKUI IKUMA
分类号 G01M99/00;G06F11/30;G01D21/00;G01H17/00;G01N29/00;G01N29/14;G01N29/30;G01N29/44 主分类号 G01M99/00
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