发明名称 Programmable MOS device formed by stressing polycrystalline silicon
摘要 A programmable memory circuit and a method for programming the same are disclosed. A polycrystalline silicon resistor pair are used in a programmable memory cell. The pair includes a first polycrystalline silicon resistor stressable by a predetermined current thereacross, and a second polycrystalline silicon resistor similarly structured as the first polycrystalline silicon resistor stressable by the predetermined current, wherein when only the first resistor is stressed by the predetermined current, a resistance of the first resistor is lowered as compared to the unstressed second resistor, thereby programming the memory cell.
申请公布号 US7079412(B2) 申请公布日期 2006.07.18
申请号 US20040784705 申请日期 2004.02.23
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 CHEN CHUNG-HUI;HSU SHUN-LIANG;FANG YEAN-KUEN
分类号 G11C11/00;G11C7/00;G11C17/00;G11C17/14 主分类号 G11C11/00
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