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发明名称
CMP SLURRY OF LOW OXIDE EROSION FOR CHEMICAL MECHANICAL POLISHING OF METAL LINES
摘要
申请公布号
KR20060082450(A)
申请公布日期
2006.07.18
申请号
KR20050002948
申请日期
2005.01.12
申请人
CHEIL INDUSTRIES INC.
发明人
LEE, JAE SEOK;KANG, DONG HUN;LA, JUNG IN;LEE, IN KYUNG
分类号
C09K3/14
主分类号
C09K3/14
代理机构
代理人
主权项
地址
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