Methods and Apparatus for Cleaning Semiconductor Substrates after Polishing Copper Film,申请号KR20007004249-传众专利搜索

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发明名称	Methods and Apparatus for Cleaning Semiconductor Substrates after Polishing Copper Film
摘要
申请公布号	KR100597909(B1)	申请公布日期	2006.07.13
申请号	KR20007004249	申请日期	2000.04.20
申请人		发明人
分类号	H01L21/304	主分类号	H01L21/304
代理机构		代理人
主权项
地址

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