发明名称 |
Plasma process device |
摘要 |
A plasma processing apparatus includes: a processing chamber; an inlet waveguide having an interior space in which a first standing wave of a microwave is formed by means of resonance; a dielectric within which a second standing wave of the microwave is formed by means of resonance; and a slot antenna having a slot through which the microwave is passed from the interior space to the dielectric. The slot is generally located at a point where the position of a loop in the first standing wave orthogonally projected to the slot antenna coincides with the position of a loop in the second standing wave orthogonally projected to the slot antenna. The present invention provides a plasma processing apparatus that improves the propagation efficiency of a microwave passed through an aperture of the slot antenna, thereby allowing microwave energy to be efficiently introduced into a processing chamber.
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申请公布号 |
US2006150914(A1) |
申请公布日期 |
2006.07.13 |
申请号 |
US20050545355 |
申请日期 |
2005.08.11 |
申请人 |
YAMAMOTO NAOKO;YAMAMOTO TATSUSHI;HIRAYAMA MASAKI;OHMI TADAHIRO |
发明人 |
YAMAMOTO NAOKO;YAMAMOTO TATSUSHI;HIRAYAMA MASAKI;OHMI TADAHIRO |
分类号 |
C23C16/00;H05H1/46;B01J19/08;C23C16/511;C23F1/00;H01J37/32;H01L21/205;H01L21/3065 |
主分类号 |
C23C16/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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